Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications: Vol. 23 (Thin Films): Volume 23 - Hardcover
Synopsis
Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.
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Physics of Thin Films: Modeling of Film Deposition for Microelectronic Applications (Volume 23)
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Advances in Research and Development Vol. 23 : Modeling of Film Deposition for Microelectronic Applications
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Elsevier Science & Technology, 1997
ISBN 10: 0125330235
ISBN 13: 9780125330237
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Advances in Research and Development
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Advances in Research and Development
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Advances in Research and Development
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Thin Films - Advances In Research And Development Modeling Of Film Deposition For Microelectronic Applications
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ADVANCE IN RESEARCH AND DEVELOPMENT
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Thin Films - Advances In Research And Development Modeling Of Film Deposition For Microelectronic Applications
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ADVANCE IN RESEARCH AND DEVELOPMENT
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