Directed Self-Assembly of Block Co-Polymers for Nano-Manufacturing (Woodhead Publishing Series in Electronic and Optical Materials)

9780081002506: Directed Self-Assembly of Block Co-Polymers for Nano-Manufacturing (Woodhead Publishing Series in Electronic and Optical Materials)

The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. * Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic* Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing * Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields

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Published by ELSEVIER SCIENCE TECHNOLOGY, United Kingdom (2015)
ISBN 10: 0081002505 ISBN 13: 9780081002506
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Book Description ELSEVIER SCIENCE TECHNOLOGY, United Kingdom, 2015. Hardback. Book Condition: New. 229 x 152 mm. Language: English . Brand New Book. The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. * Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic* Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing * Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields. Bookseller Inventory # AAU9780081002506

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Book Description Elsevier Science & Technology. Hardback. Book Condition: new. BRAND NEW, Directed Self-Assembly of Block Co-Polymers for Nano-Manufacturing, Roel Gronheid, Paul Nealey, The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. * Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic* Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing * Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields. Bookseller Inventory # B9780081002506

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Published by ELSEVIER SCIENCE TECHNOLOGY, United Kingdom (2015)
ISBN 10: 0081002505 ISBN 13: 9780081002506
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Book Description ELSEVIER SCIENCE TECHNOLOGY, United Kingdom, 2015. Hardback. Book Condition: New. 229 x 152 mm. Language: English . Brand New Book. The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. * Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic* Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing * Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields. Bookseller Inventory # AAU9780081002506

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Book Description Woodhead Pub Ltd, 2015. Hardcover. Book Condition: Brand New. 326 pages. 9.00x6.25x0.75 inches. In Stock. Bookseller Inventory # __0081002505

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Book Description Hardback. Book Condition: New. Not Signed; The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufactur. book. Bookseller Inventory # ria9780081002506_rkm

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