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Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide: 49 (Springer Series in Surface Sciences, 49) - Hardcover

 
9783642273803: Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide: 49 (Springer Series in Surface Sciences, 49)
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To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.  

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Product Description:
The level and scope of the book is designed for those working with AES: for technicians (operators), graduate students and researchers. Therefore, the emphasis is on guiding the user to optimize his/her work with AES. After a short introduction, the technique is presented step by step in a logical sequence, from sample preparation and instrument setup through data acquisition to data evaluation. Guidance to problem solving and a number of typical, worked examples facilitate quick access to sufficient expertise to acquire, treat and judge AES data in a reliable manner. The book will thus be invaluable, not only to the practical analyst, but also to the scientific supervisor and laboratory manager.

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  • PublisherSpringer
  • Publication date2012
  • ISBN 10 3642273807
  • ISBN 13 9783642273803
  • BindingHardcover
  • Number of pages548

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9783642431739: Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide: 49 (Springer Series in Surface Sciences, 49)

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ISBN 10:  3642431739 ISBN 13:  9783642431739
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  • 9783642273827: Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriented Guide

    Springer, 2012
    Softcover

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Book Description Buch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented. 548 pp. Englisch. Seller Inventory # 9783642273803

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Book Description Buch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented. Seller Inventory # 9783642273803

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