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Published by Springer, 2012
ISBN 10: 3642630960ISBN 13: 9783642630965
Seller: booksXpress, Bayonne, NJ, U.S.A.
Book
Soft Cover. Condition: new.
Published by Springer, 2012
ISBN 10: 3642630960ISBN 13: 9783642630965
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Book Print on Demand
Condition: New. PRINT ON DEMAND Book; New; Fast Shipping from the UK. No. book.
Published by Springer Berlin Heidelberg, 2012
ISBN 10: 3642630960ISBN 13: 9783642630965
Seller: moluna, Greven, Germany
Book
Kartoniert / Broschiert. Condition: New.
Published by Springer, 2012
ISBN 10: 3642630960ISBN 13: 9783642630965
Seller: Lucky's Textbooks, Dallas, TX, U.S.A.
Book
Condition: New.
Published by Springer Berlin Heidelberg Nov 2012, 2012
ISBN 10: 3642630960ISBN 13: 9783642630965
Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germany
Book Print on Demand
Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed 'trial-and-error' approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved. 672 pp. Englisch.
Published by Springer Berlin Heidelberg, 2012
ISBN 10: 3642630960ISBN 13: 9783642630965
Seller: AHA-BUCH GmbH, Einbeck, Germany
Book
Taschenbuch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed 'trial-and-error' approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.
Published by Springer, 2012
ISBN 10: 3642630960ISBN 13: 9783642630965
Seller: Books Puddle, New York, NY, U.S.A.
Book
Condition: New. pp. 672.
Published by Springer Verlag, 2012
ISBN 10: 3642630960ISBN 13: 9783642630965
Seller: Revaluation Books, Exeter, United Kingdom
Book
Paperback. Condition: Brand New. reprint edition. 672 pages. 9.25x6.10x1.93 inches. In Stock.
Published by Springer, 2012
ISBN 10: 3642630960ISBN 13: 9783642630965
Seller: Majestic Books, Hounslow, United Kingdom
Book Print on Demand
Condition: New. Print on Demand pp. 672.