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"... a toolbox for individuals needing practical knowledge in the area of photopolymers and photoresist materials. It contains practical guidance in chemistry, fabrication, and industrial reduction-to-practice of photopolymer technology. The volume is comprised of five chapters. A major theme of the book is the relationship between photopolymer technology and the increasing miniaturization of electronic and mechanical devices. ... This short book has enough material to give a novice a good start in the field of photopolymer technology. It is written at a level appropriate for individuals with a chemistry or polymer engineering background."
―Thomas M. Cooper, Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio, USA, from MRS Bulletin, April 2015
"... fit for a chemist who wants to learn the physical principles of optical lithographic techniques."
―Dejan Pantelić, Institute of Physics, Belgrade, Serbia, from Optics & Photonics News, April 2015
Kenichiro Nakamura graduated from Kanazawa University, Japan in 1963 and from the University of Tokyo, Japan in 1968 with his doctorate in engineering. He conducted his postdoctoral fellowship at the University of Texas at Austin, USA in 1968–1970. His experience also includes working for Prof. Albert Noyes in photochemistry; holding the positions of associate professor (1970–1978), professor (1978–2010), and honorary professor (2010–present) at Tokai University, Japan; and serving as editor-in-chief of the Journal of Photopolymer Science and Technology (1998–present). In addition to books, his work has been published in many prestigious journals.
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