EUV Lithography (Press Monograph) (Press Monographs) - Hardcover

9780819469649: EUV Lithography (Press Monograph) (Press Monographs)

Hardcover

ISBN 10: 0819469645 ISBN 13: 9780819469649

Publisher: SPIE Press, 2009

Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists.This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field.The contents include: the history of EUV Lithography; EUV source technology (requirements, technology descriptions, and status); EUV optics (projection system design, multilayer coatings, and substrates); various EUV wavefront measurement techniques for optical testing; contamination and its control in EUVL scanners (optics and collector optics contamination); EUV mask and mask metrology (substrates, blank fabrication, absorber stacks and backside conductive coatings, patterning, cleaning, and phase shift masks); the fundamentals and development of EUV resist technology, including LER; the design and components of the first METs, which have enabled resist development; the fundamental design considerations for an EUVL scanner and descriptions of a full-field scanner's various components; EUVL system patterning performance; and, lithography cost of ownership. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology.

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Review:

"Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. " - Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc.

About the Author:

Dr Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.

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