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Semiconductor Micromachining, Techniques and Industrial Applications (Volume 2)

Campbell, S. a., Lewerenz, H. L., Campbell, Dave

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ISBN 10: 0471966827 / ISBN 13: 9780471966821
Published by Wiley
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1998. Volume 2. Paperback. A two-volume comprehensive guide to both the fundamental physics and chemistry of semiconductor processing, this text covers a broad range of topics ranging from chemical processes through to the microstructuring of semiconductors. Volume two concerns techniques and industrial applications. Editor(s): Campbell, S. A.; Lewerenz, H. J. Num Pages: 406 pages, 141 illustrations, 34 graphs, 18 tables. BIC Classification: PH; PNRH; TDC; TJFC. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly. Dimension: 237 x 163 x 29. Weight in Grams: 742. Techniques and Industrial Applications. 406 pages, 141 illustrations, 34 graphs, 18 tables. Editor(s): Campbell, S. A.; Lewerenz, H. J. A two-volume comprehensive guide to both the fundamental physics and chemistry of semiconductor processing, this text covers a broad range of topics ranging from chemical processes through to the microstructuring of semiconductors. Volume two concerns techniques and industrial applications. Cateogry: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly. BIC Classification: PH; PNRH; TDC; TJFC. Dimension: 237 x 163 x 29. Weight: 742. . . . . . Books ship from the US and Ireland. Bookseller Inventory # V9780471966821

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Bibliographic Details

Title: Semiconductor Micromachining, Techniques and...

Publisher: Wiley

Binding: Soft cover

Book Condition:New

About this title

Synopsis:

Semiconductor Micromachining - Fundamentals and Technology - is a two volume work in which, for the first time, the various disciplines associated with the theory and practice of device fabrication are brought together in one comprehensive reference source. Volume 1 contains a detailed coverage of semiconductor electrochemistry and physics whilst Volume 2 describes the wide range of microengineering technologies with details of practical applications. The authors for each chapter have been carefully selected for their expertise and are acknowledged leaders in their respective fields. The purpose of this book is to enable workers in the area of semiconductor micromachining to have ready access to the basic literature, essential to provide a solid basis for the many different aspects of physics, chemistry, electronics and engineering involved with this technology. The main focus of the book is on structures based on silicon, the most common and versatile of the current range of commercially available semiconductors, but other materials such as III-V semiconductors are also considered. Together these two volumes provide an indispensable reference text for this fast growing area of applied science. It will be of value to a wide range of academic and industrial scientists, technologists and engineers who wish to expand their knowledge in this area of science and for whom thus far, there has been no convenient reference work. Volume 1: Fundamental Electrochemistry and Physics

From the Publisher:

A comprehensive guide to both the fundamental chemistry and physics of semiconductor processing. This book demonstrates the feasibility of structuring semiconductors for device technology.

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