Items related to Extreme Ultraviolet Lithography: Principles and Basic...
Synopsis
This book describes the principles and basic technologies of extreme ultraviolet lithography (EUVL). The topics include why research on EUVL was begun and why an exposure wavelength of 13.5 nm was selected; the design of the optical system, which employs reflective mirror; the use of a multilayer film to make a reflective-type mask and how masks are inspected; an historical overview of the development of light sources; resist materials; and the recent performance of lithographic tools for mass production. Three innovations were key to the development: of Mo/Si multilayer films with a high reflectivity and to the shaping and metrology of aspherical mirrors with a precision of less than 0.1 nm. The technology for measuring figure error and the fabrication technology now meet the performance targets. Thus, EUVL has become the most practical lithographic technology for device fabrication at the less than 7-nm node.
"synopsis" may belong to another edition of this title.
- PublisherScholars' Press
- Publication date2021
- ISBN 10 6138959655
- ISBN 13 9786138959656
- BindingPaperback
- LanguageEnglish
- Number of pages196
Buy New
View this item
£ 56.27
£ 20.97 shipping from Germany to United Kingdom
Destination, rates & speeds
Search results for Extreme Ultraviolet Lithography: Principles and Basic...
Seller Image
Extreme Ultraviolet Lithography
Seller: moluna, Greven, Germany
Seller rating 4 out of 5 stars
Condition: New. Seller Inventory # 511545120
Quantity: Over 20 available
Seller Image
Extreme Ultraviolet Lithography : Principles and Basic Technologies
Print on DemandSeller: AHA-BUCH GmbH, Einbeck, Germany
Seller rating 5 out of 5 stars
Taschenbuch. Condition: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - This book describes the principles and basic technologies of extreme ultraviolet lithography (EUVL). The topics include why research on EUVL was begun and why an exposure wavelength of 13.5 nm was selected; the design of the optical system, which employs reflective mirror; the use of a multilayer film to make a reflective-type mask and how masks are inspected; an historical overview of the development of light sources; resist materials; and the recent performance of lithographic tools for mass production. Three innovations were key to the development: of Mo/Si multilayer films with a high reflectivity and to the shaping and metrology of aspherical mirrors with a precision of less than 0.1 nm. The technology for measuring figure error and the fabrication technology now meet the performance targets. Thus, EUVL has become the most practical lithographic technology for device fabrication at the less than 7-nm node. Seller Inventory # 9786138959656
Quantity: 1 available