Materials, Processes and Reliability for Advanced Interconnects for Micro- and Nanoelectronics ― 2009: Volume 1156: Symposium Held April 14-17, 2009, ... 2009, San Francisco, California, U.s.a. - Hardcover

Hardcover

ISBN 10: 1605111295 ISBN 13: 9781605111292

Publisher: Cambridge University Press, 2009

Synopsis

Enabled by the development and introduction of new materials, the semiconductor industry continues to follow Moore's law into 32nm and 22nm technologies. Advanced interconnect structures require the use of porous dielectrics with further reduced k-values and even weaker mechanical properties, as well as much thinner metallization liners. In addition, the increasing resistivity of Cu at decreasing dimensions must be addressed in order to maintain the performance of continuously shrinking devices. To deal with these issues, and to maintain the reliability of the interconnects, innovations in materials, processes and architectures are needed. This book brings together researchers from around the world to exchange the latest advances in materials, processes, integration and reliability in advanced interconnects and packaging, and to discuss interconnects for emerging technologies. Papers from a joint session with Symposium F, Packaging, Chip-Package Interactions and Solder Materials Challenges, are also included and focus on 3D chip stacking and molecular electronics.

Edition details

• Publisher: Cambridge University Press
• Publication date: 2009
• Language: English
• ISBN 10: 1605111295
• ISBN 13: 9781605111292
• Binding: Hardcover
• Number of pages: 204
• Editor: Gall Martin, Grill Alfred, Lacopi Francesca, Koike Junichi, Usui Takamasa