Items related to Advances in X-Ray Analysis
Synopsis
The 39th Annual Denver X-Ray Conference on Applications of X-Ray Analysis was held July 30 -August 3, 1990, at the Sheraton Steamboat Resort and Conference Center, Steamboat Springs, Colorado. The "Denver Conference" is recognized to be a major event in the x-ray analysis field, bringing together scientists and engineers from around the world to discuss the state of the art in x-ray applications as well as indications for future develop ments. In recent years there has been a steady expansion of applications of x-ray analysis to characterize surfaces and thin films. To introduce the audience to one of the exciting and important new developments in x-ray fluorescence, the topic for the Plenary Session of the 1990 Conference was: "Surface and Near-Surface X-Ray Spectroscopy. " The Conference had the privilege of inviting five leading world experts in the field of x-ray spectroscopy to deliver lectures at the Plenary Session. The first two lectures were on total-reflection x-ray fluorescence spectrometry. Professor P. Wobrauschek of Austria reviewed "Recent Developments and Results in Total-Reflection X-Ray Fluorescence. " Trends and applications of the technique were also discussed. Dr. T. Arai of Japan reported on "Surface and Near-Surface Analysis of Silicon Wafers by Total Reflection X-Ray Fluorescence. " He emphasized the importance of using proper x-ray optics to achieve high signal-to-noise ratios. A mathematical model relating the x-ray intensity to the depth of x-ray penetration was also described.
"synopsis" may belong to another edition of this title.
- PublisherSpringer
- Publication date2013
- ISBN 10 1461366674
- ISBN 13 9781461366676
- BindingPaperback
- Number of pages764
- EditorBarrett C.S., Amara M., Huang Ting C., Bernard Nick, Knorr Dietrich
Other Popular Editions of the Same Title
Top Search Results from the AbeBooks Marketplace
Seller Image
Advances in X-Ray Analysis [Paperback ]
Print on DemandSeller: booksXpress, Bayonne, NJ, U.S.A.
Seller rating 4 out of 5 stars
Soft Cover. Condition: new. This item is printed on demand. Seller Inventory # 9781461366676
Quantity: 10 available
Stock Image
Advances in X-Ray Analysis
Seller: Lucky's Textbooks, Dallas, TX, U.S.A.
Seller rating 5 out of 5 stars
Condition: New. Seller Inventory # ABLIING23Mar2716030033223
Quantity: Over 20 available
Seller Image
Advances in X-Ray Analysis
Seller: GreatBookPrices, Columbia, MD, U.S.A.
Seller rating 5 out of 5 stars
Condition: New. Seller Inventory # 21687695-n
Quantity: 5 available
Stock Image
Advances in X-Ray Analysis
Print on DemandSeller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
Condition: New. PRINT ON DEMAND Book; New; Fast Shipping from the UK. No. book. Seller Inventory # ria9781461366676_lsuk
Quantity: Over 20 available
Seller Image
Advances in X-Ray Analysis
Seller: GreatBookPricesUK, Castle Donington, DERBY, United Kingdom
Seller rating 5 out of 5 stars
Condition: New. Seller Inventory # 21687695-n
Quantity: 5 available
Stock Image
Advances in X-Ray Analysis
Seller: Revaluation Books, Exeter, United Kingdom
Seller rating 5 out of 5 stars
Paperback. Condition: Brand New. reprint edition. 764 pages. 10.00x7.01x1.53 inches. In Stock. Seller Inventory # x-1461366674
Quantity: 2 available
Seller Image
Advances in X-Ray Analysis
Seller: AHA-BUCH GmbH, Einbeck, Germany
Seller rating 5 out of 5 stars
Taschenbuch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - The 39th Annual Denver X-Ray Conference on Applications of X-Ray Analysis was held July 30 -August 3, 1990, at the Sheraton Steamboat Resort and Conference Center, Steamboat Springs, Colorado. The 'Denver Conference' is recognized to be a major event in the x-ray analysis field, bringing together scientists and engineers from around the world to discuss the state of the art in x-ray applications as well as indications for future develop ments. In recent years there has been a steady expansion of applications of x-ray analysis to characterize surfaces and thin films. To introduce the audience to one of the exciting and important new developments in x-ray fluorescence, the topic for the Plenary Session of the 1990 Conference was: 'Surface and Near-Surface X-Ray Spectroscopy. ' The Conference had the privilege of inviting five leading world experts in the field of x-ray spectroscopy to deliver lectures at the Plenary Session. The first two lectures were on total-reflection x-ray fluorescence spectrometry. Professor P. Wobrauschek of Austria reviewed 'Recent Developments and Results in Total-Reflection X-Ray Fluorescence. ' Trends and applications of the technique were also discussed. Dr. T. Arai of Japan reported on 'Surface and Near-Surface Analysis of Silicon Wafers by Total Reflection X-Ray Fluorescence. ' He emphasized the importance of using proper x-ray optics to achieve high signal-to-noise ratios. A mathematical model relating the x-ray intensity to the depth of x-ray penetration was also described. Seller Inventory # 9781461366676
Quantity: 1 available
Stock Image
Advances in X-Ray Analysis
Seller: Chiron Media, Wallingford, United Kingdom
Seller rating 5 out of 5 stars
PF. Condition: New. Seller Inventory # 6666-IUK-9781461366676
Quantity: 10 available
Seller Image
Advances in X-Ray Analysis
Print on DemandSeller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germany
Seller rating 5 out of 5 stars
Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The 39th Annual Denver X-Ray Conference on Applications of X-Ray Analysis was held July 30 -August 3, 1990, at the Sheraton Steamboat Resort and Conference Center, Steamboat Springs, Colorado. The 'Denver Conference' is recognized to be a major event in the x-ray analysis field, bringing together scientists and engineers from around the world to discuss the state of the art in x-ray applications as well as indications for future develop ments. In recent years there has been a steady expansion of applications of x-ray analysis to characterize surfaces and thin films. To introduce the audience to one of the exciting and important new developments in x-ray fluorescence, the topic for the Plenary Session of the 1990 Conference was: 'Surface and Near-Surface X-Ray Spectroscopy. ' The Conference had the privilege of inviting five leading world experts in the field of x-ray spectroscopy to deliver lectures at the Plenary Session. The first two lectures were on total-reflection x-ray fluorescence spectrometry. Professor P. Wobrauschek of Austria reviewed 'Recent Developments and Results in Total-Reflection X-Ray Fluorescence. ' Trends and applications of the technique were also discussed. Dr. T. Arai of Japan reported on 'Surface and Near-Surface Analysis of Silicon Wafers by Total Reflection X-Ray Fluorescence. ' He emphasized the importance of using proper x-ray optics to achieve high signal-to-noise ratios. A mathematical model relating the x-ray intensity to the depth of x-ray penetration was also described. 768 pp. Englisch. Seller Inventory # 9781461366676
Quantity: 2 available
Seller Image
Advances in X-Ray Analysis
Seller: GreatBookPricesUK, Castle Donington, DERBY, United Kingdom
Seller rating 5 out of 5 stars
Condition: As New. Unread book in perfect condition. Seller Inventory # 21687695
Quantity: 5 available