Resolution Enhancement Techniques in Optical Lithography: v. TT47 (Spie Press Monograph) (Tutorial Texts) - Softcover

Wong, Alfred Kwok-Kit

Softcover

ISBN 10: 0819439959 ISBN 13: 9780819439956

Publisher: SPIE Press, 2001

Synopsis

The acceleration of integrated circuit miniaturization is challenging lithographers to push the limits of optical lithography by ever more precise engineering and innovations. As IC device dimensions grow smaller, circuits outpace the introduction of shorter exposure wavelengths and higher numerical aperture lenses, increasing the importance of resolution enhancement techniques. This work summarizes the latest enhancement research that has matured since the 1980s. Theoretical and practical aspects of commonly used techniques are discussed, serving students and practising lithographers alike. #Conoptical Imaging And Resolution; Modified Illumination; Optical Proximity Correction; Alternating Phase-Shifting Mask; Attenuated Phase-Shifting Mask; Selecting Appropriate Rets; Second Generation Rets; Concluding Remarks.

About this edition

• Publisher: SPIE Press
• Publication date: 2001
• ISBN 10: 0819439959
• ISBN 13: 9780819439956
• Binding: Paperback
• Number of pages: 214