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The acceleration of integrated circuit miniaturization is challenging lithographers to push the limits of optical lithography by ever more precise engineering and innovations. As IC device dimensions grow smaller, circuits outpace the introduction of shorter exposure wavelengths and higher numerical aperture lenses, increasing the importance of resolution enhancement techniques. This work summarizes the latest enhancement research that has matured since the 1980s. Theoretical and practical aspects of commonly used techniques are discussed, serving students and practising lithographers alike. #Conoptical Imaging And Resolution; Modified Illumination; Optical Proximity Correction; Alternating Phase-Shifting Mask; Attenuated Phase-Shifting Mask; Selecting Appropriate Rets; Second Generation Rets; Concluding Remarks.
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Book Description Brand: SPIE Publications, 2001. Paperback. Condition: BRAND NEW. Seller Inventory # 0819439959_abe_bn
Book Description SPIE Publications, 2001. Paperback. Condition: New. Seller Inventory # DADAX0819439959
Book Description SPIE Publications, 2001. Condition: New. book. Seller Inventory # M0819439959
Book Description Condition: New. New. Seller Inventory # S-0819439959
Book Description Society of Photo Optical, 2001. Paperback. Condition: Brand New. 1st edition. 234 pages. 10.00x7.25x0.50 inches. In Stock. Seller Inventory # 0819439959
Book Description SPIE Publications. PAPERBACK. Condition: New. 0819439959 New Condition. Seller Inventory # NEW33.3462655
Book Description SPIE Publications, 2001. Condition: New. Seller Inventory # 0819439959